학술논문
The Impact of Forming Temperature and Voltage on the Reliability of Filamentary RRAM
Document Type
Conference
Author
Source
2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) VLSI Technology, Systems and Application (VLSI-TSA), 2019 International Symposium on. :1-2 Apr, 2019
Subject
Language
Abstract
The forming voltage and temperature for creating the first filament in the RRAM device are found having impacts on RRAM reliability. The correlation between the forming temperature and the required voltage was evaluated on the WOx/TiOx RRAM devices, and then the reliability tests including cycling endurance and data retention were performed. A model was proposed to explain the results.