학술논문

Electrical Characterization of Plasma-Assisted Electron Beam Source With Sub-mm Sheet Aperture
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 70(2):771-775 Feb, 2023
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Electron beams
Electric potential
Anodes
Cathodes
Electric breakdown
Current density
Apertures
Electron beam source
plasma
pseudospark (PS)
Language
ISSN
0018-9383
1557-9646
Abstract
In this article, the electrical characterization of a plasma-assisted electron beam source with a sub-mm sheet aperture has been performed. The developed sheet electron beam source comprises a hollow cathode cavity, two floating anodes, and one ground potential anode with a sheet aperture of $1.5\times0.3$ mm. The source has been characterized under varying applied gap potential range, i.e., 10–30 kV in self-breakdown operating mode. The breakdown parameters and resultant beam parameters, such as ${V} - {I}$ characteristics, electron beam current density, duration to reach the conductive phase, and the energy transformation efficiency of the developed source, have been analyzed. The successive breakdown phenomenon has also been presented in the profile of the developed electron beam source.