학술논문

Capacitive Modulator Design Optimization Using Si and Strained-SiGe for Datacom Applications
Document Type
Periodical
Source
IEEE Journal of Selected Topics in Quantum Electronics IEEE J. Select. Topics Quantum Electron. Selected Topics in Quantum Electronics, IEEE Journal of. 27(3):1-8 Jun, 2021
Subject
Engineered Materials, Dielectrics and Plasmas
Photonics and Electrooptics
Silicon
Optical modulation
Silicon germanium
Optical waveguides
Optimization
Optical refraction
Capacitive modulator
electro-refractive modulator
silicon photonics
strained-SiGe
Language
ISSN
1077-260X
1558-4542
Abstract
Silicon photonics has become an industrial reality for datacom applications. Nevertheless, as Si suffers from a low electro-optic effect, commercial modulators are few-mm long. The efficiency can be enhanced by using strained-SiGe or by using a semiconductor insulator semiconductor (SIS) architecture. In this paper, we develop a model based on a perturbative approach to optimize capacitive modulator using full-Si or including a thin layer of strained SiGe. This model is coupled with an optimization algorithm in order to estimate the highest optimal modulation amplitude for different operating frequencies.