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Defect repair for extreme-ultraviolet lithography (EUVL) mask blanks.

Document Type

Article

Author

Hau-Riege, Stefan P.; Barty, Anton; Mirkarimi, Paul B.; Stearns, Daniel G.; Chapman, Henry N.; Sweeney, Donald W.; Clift, W. Miles; Gullikson, Eric; Yi, Moon-Suk

Source

Proceedings of SPIE; Nov2003, Issue 1, p331-338, 8p

Subject

Language

ISSN

0277786X

Online Access

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