학술논문

Fabrication and Characterization of Silicon-Based Antimonene Thin Film via Electron Beam Evaporation.
Document Type
Article
Source
Materials (1996-1944). Mar2024, Vol. 17 Issue 5, p1090. 14p.
Subject
*THIN films
*MOLECULAR beam epitaxy
*Q-switched lasers
*SILICON films
*SCANNING electron microscopes
*ELECTRON beams
*ION beams
Language
ISSN
1996-1944
Abstract
Antimonene has attracted much attention due to its excellent characteristics of high carrier mobility, thermoelectric properties and high stability. It has great application prospects in Q-switched lasers, laser protection and spintronics. At present, the epitaxy growth of antimonene mainly depends on molecular beam epitaxy. We have successfully prepared antimonene films on silicon, germanium/silicon substrates for the first time using electron beam evaporation coating and studied the effects of the deposition rate and substrate on the preparation of antimonene; film characterization was performed via confocal microprobe Raman spectroscopy, via X-ray diffraction and using a scanning electron microscope. Raman spectroscopy showed that different deposition rates can lead to the formation of different structures of antimonene, such as α phase and β phase. At the same time, it was found that the growth of antimonene is also affected by different substrates and ion beams. [ABSTRACT FROM AUTHOR]