학술논문
Liberating a hidden antiferroelectric phase with interfacial electrostatic engineering.
Document Type
Article
Author
Mundy, Julia A.; Grosso, Bastien F.; Heikes, Colin A.; Segedin, Dan Ferenc; Zhe Wang; Yu-Tsun Shao; Cheng Dai; Goodge, Berit H.; Meier, Quintin N.; Nelson, Christopher T.; Prasad, Bhagwati; Fei Xue; Ganschow, Steffen; Muller, David A.; Kourkoutis, Lena F.; Long-Qing Chen; Ratcliff, William D.; Spaldin, Nicola A.; Ramesh, Ramamoorthy; Schlom, Darrell G.
Source
Subject
*LEAD titanate
*NANOSCIENCE
*BARIUM titanate
*ELECTRON energy loss spectroscopy
*PYROELECTRICITY
*WIDE gap semiconductors
*MATERIALS science
*HYSTERESIS loop
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Language
ISSN
2375-2548
Abstract
The article presents a study that explores liberating a hidden antiferroelectric phase with interfacial electrostatic engineering. It mentions that antiferroelectric materials have seen a resurgence of interest because of proposed applications in a number of energy-efficient technologies. It discusses that use of electrostatic confinement provides an untapped pathway for the design of engineered antiferroelectric materials with large and potentially coupled responses.