학술논문
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'학술논문'
에서 검색결과 62건 | 목록
1~20
Report
Kinikar, Amogh; Englmann, Thorsten G.; Di Giovannantonio, Marco; Bassi, Nicolò; Xiang, Feifei; Stolz, Samuel; Widmer, Roland; Barin, Gabriela Borin; Turco, Elia; Díez, Néstor Merino; Eimre, Kristjan; Guerrero, Andres Ortega; Feng, Xinliang; Gröning, Oliver; Pignedoli, Carlo A.; Fasel, Roman; Ruffieux, Pascal
Academic Journal
Christina Dinh; Muhammed Yusufoglu; Kentaro Yumigeta; Amogh Kinikar; Thomas Sweepe; Zoe Zeszut; Yao-Jen Chang; Christian Copic; Shelby Janssen; Richard Holloway; Julian Battaglia; Aldiyar Kuntubek; Farhan Zahin; Yuxuan Cosmi Lin; William G. Vandenberghe; Brian J. LeRoy; Klaus Müllen; Roman Fasel; Gabriela Borin Barin; Zafer Mutlu
ACS Nano
Dinh, Christina; Yusufoglu, Muhammed; Yumigeta, Kentaro; Kinikar, Amogh; Sweepe, Thomas; Zeszut, Zoe; Chang, Yao-Jen; Copic, Christian; Janssen, Shelby; Holloway, Richard; Battaglia, Julian; Kuntubek, Aldiyar; Zahin, Farhan; Lin, Yuxuan Cosmi; Vandenberghe, WilliamG ; LeRoy, Brian J; Müllen, Klaus; Fasel, Roman; Borin Barin , Gabriela and Mutlu, Zafer (2024). Atomically Precise Graphene Nanoribbon Transistors with Long-Term Stability and Reliability. ACS nano, 18(34), pp. 22949-22957. American Chemical Society 10.1021/acsnano.4c04097
Dinh, Christina; Yusufoglu, Muhammed; Yumigeta, Kentaro; Kinikar, Amogh; Sweepe, Thomas; Zeszut, Zoe; Chang, Yao-Jen; Copic, Christian; Janssen, Shelby; Holloway, Richard; Battaglia, Julian; Kuntubek, Aldiyar; Zahin, Farhan; Lin, Yuxuan Cosmi; Vandenberghe, William
Academic Journal
Amogh Kinikar; Thorsten G. Englmann; Marco Di Giovannantonio; Nicolò Bassi; Feifei Xiang; Samuel Stolz; Roland Widmer; Gabriela Borin Barin; Elia Turco; Kristjan Eimre; Néstor Merino Díez; Andres Ortega-Guerrero; Xinliang Feng; Oliver Gröning; Carlo A. Pignedoli; Roman Fasel; Pascal Ruffieux
ACS Nano
Academic Journal
Backes, Claudia; Abdelkader, Amr M.; Alonso, Concepcion; Andrieux-Ledier, Amandine; Arenal, Raul; Azpeitia, Jon; Balakrishnan, Nilanthy; Banszerus, Luca; Barjon, Julien; Bartali, Ruben; Bellani, Sebastiano; Berger, Claire; Berger, Reinhard; Ortega, M. M. Bernal; Bernard, Carlo; Beton, Peter H.; Beyer, Andre; Bianco, Alberto; Boggild, Peter; Bonaccorso, Francesco; Barin, Gabriela Borin; Botas, Cristina; Bueno, Rebeca A.; Carriazo, Daniel; Castellanos-Gomez, Andres; Christian, Meganne; Ciesielski, Artur; Ciuk, Tymoteusz; Cole, Matthew T.; Coleman, Jonathan; Coletti, Camilla; Crema, Luigi; Cun, Huanyao; Dasler, Daniela; De Fazio, Domenico; Diez, Noel; Drieschner, Simon; Duesberg, Georg S.; Fasel, Roman; Feng, Xinliang; Fina, Alberto; Forti, Stiven; Galiotis, Costas; Garberoglio, Giovanni; Garcia, Jorge M.; Antonio Garrido, Jose; Gibertini, Marco; Goelzhaeuser, Armin; Gomez, Julio; Greber, Thomas; Hauke, Frank; Hemmi, Adrian; Hernandez-Rodriguez, Irene; Hirsch, Andreas; Hodge, Stephen A.; Huttel, Yves; Jepsen, Peter U.; Jimenez, Ignacio; Kaiser, Ute; Kaplas, Tommi; Kim, HoKwon; Kis, Andras; Papagelis, Konstantinos; Kostarelos, Kostas; Krajewska, Aleksandra; Lee, Kangho; Li, Changfeng; Lipsanen, Harri; Liscio, Andrea; Lohe, Martin R.; Loiseau, Annick; Lombardi, Lucia; Francisca Lopez, Maria; Martin, Oliver; Martin, Cristina; Martinez, Lidia; Angel Martin-Gago, Jose; Ignacio Martinez, Jose; Marzari, Nicola; Mayoral, Alvaro; McManus, John; Melucci, Manuela; Mendez, Javier; Merino, Cesar; Merino, Pablo; Meyer, Andreas P.; Miniussi, Elisa; Miseikis, Vaidotas; Mishra, Neeraj; Morandi, Vittorio; Munuera, Carmen; Munoz, Roberto; Nolan, Hugo; Ortolani, Luca; Ott, Anna K.; Palacio, Irene; Palermo, Vincenzo, 1972; Parthenios, John; Pasternak, Iwona; Patane, Amalia; Prato, Maurizio; Prevost, Henri; Prudkovskiy, Vladimir; Pugno, Nicola; Rojo, Teofilo; Rossi, Antonio; Ruffieux, Pascal; Samori, Paolo; Schue, Leonard; Setijadi, Eki; Seyller, Thomas; Speranza, Giorgio; Stampfer, Christoph; Stenger, Ingrid; Strupinski, Wlodek; Svirko, Yuri; Taioli, Simone; Teo, Kenneth B. K.; Testi, Matteo; Tomarchio, Flavia; Tortello, Mauro; Treossi, Emanuele; Turchanin, Andrey; Vazquez, Ester; Villaro, Elvira; Whelan, Patrick R.; Xia, Zhenyuan, 1983; Yakimova, Rositza; Yang, Sheng; Reza Yazdi, G.; Yim, Chanyoung; Yoon, Duhee; Zhang, Xianghui; Zhuang, Xiaodong; Colombo, Luigi; Ferrari, Andrea C.; Garcia-Hernandez, Mar
2D Materials. 7(2)
Academic Journal
Braun, Oliver ; Overbeck, Jan ; El Abbassi, Maria ; Käser, Silvan ; Furrer, Roman ; Olziersky, Antonis ; Flasby, Alexander ; Borin Barin, Gabriela ; Sun, Qiang ; Darawish, Rimah ; Müllen, Klaus ; Ruffieux, Pascal ; Fasel, Roman ; Shorubalko, Ivan ; Perrin, Mickael L. ; Calame, Michel
In Carbon 30 October 2021 184:331-339
Academic Journal
Sihan Zhao; Gabriela Borin Barin; Ting Cao; Jan Overbeck; Rimah Darawish; Tairu Lyu; Steve Drapcho; Sheng Wang; Tim Dumslaff; Akimitsu Narita; Michel Calame; Klaus Müllen; Steven G. Louie; Pascal Ruffieux; Roman Fasel; Feng Wang
Nano Letters
Academic Journal
Hwang JH; nanotech@surfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Department of Information Technology and Electrical Engineering, ETH Zürich, 8092 Zürich, Switzerland.; Bassi N; nanotech@surfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Fadel M; Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, United States.; Braun O; Transport at Nanoscale Interfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Department of Physics, University of Basel, 4056 Basel, Switzerland.; Dumslaff T; Max Planck Institute for Polymer Research, 55128 Mainz, Germany.; Pignedoli CA; nanotech@surfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Stiefel M; Transport at Nanoscale Interfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Furrer R; Transport at Nanoscale Interfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Hayashi H; Center for Basic Research on Materials, National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan.; Yamada H; Kyoto University, Kyoto 606-8501, Japan.; Narita A; Max Planck Institute for Polymer Research, 55128 Mainz, Germany.; Müllen K; Max Planck Institute for Polymer Research, 55128 Mainz, Germany.; Calame M; Transport at Nanoscale Interfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Department of Physics, University of Basel, 4056 Basel, Switzerland.; Swiss Nanoscience Institute, University of Basel, 4056 Basel, Switzerland.; Perrin M; Department of Information Technology and Electrical Engineering, ETH Zürich, 8092 Zürich, Switzerland.; Transport at Nanoscale Interfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Quantum Center, ETH Zürich, 8093 Zürich, Switzerland.; Fasel R; nanotech@surfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Department of Chemistry, Biochemistry and Pharmaceutical Sciences, University of Bern, 3012 Bern, Switzerland.; Ruffieux P; nanotech@surfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Meunier V; Department of Engineering Science and Mechanics, Pennsylvania State University, University Park, Pennsylvania 16802, United States.; Borin Barin G; nanotech@surfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: MEDLINE; PubMed not MEDLINE
Academic Journal
Pérez-Elvira E; IMDEA Nanoscience, C/ Faraday 9, Campus de Cantoblanco, Madrid, 28049, Spain.; Wu F; Max Planck Institute of Microstructure Physics, Weinberg 2, 06120, Halle, Germany.; Hwang JH; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf, 8600, Switzerland.; Department of Information Technology and Electrical Engineering, ETH Zurich, Zurich, 8092, Switzerland.; Ma J; College of Materials Science and Optoelectronic Technology &Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Science, Beijing, 100049, P. R. China.; Palomino-Ruiz L; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf, 8600, Switzerland.; Departamento de Química Orgánica, Facultad de Ciencias, Universidad de Granada, Unidad de Excelencia en Química (UEQ), Granada, 18071, Spain.; Canola S; Institute of Physics of the Czech Academy of Science, Cukrovarnická 10, Praha, 162 00, Czech Republic.; Barragán A; IMDEA Nanoscience, C/ Faraday 9, Campus de Cantoblanco, Madrid, 28049, Spain.; Lauwaet K; IMDEA Nanoscience, C/ Faraday 9, Campus de Cantoblanco, Madrid, 28049, Spain.; Gallego JM; Instituto de Ciencia de Materiales de Madrid (ICMM), CSIC, Cantoblanco, Madrid, 28049, Spain.; Miranda R; IMDEA Nanoscience, C/ Faraday 9, Campus de Cantoblanco, Madrid, 28049, Spain.; Perrin ML; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf, 8600, Switzerland.; Department of Information Technology and Electrical Engineering, ETH Zurich, Zurich, 8092, Switzerland.; Quantum Center, ETH Zürich, Zürich, 8093, Switzerland.; Écija D; IMDEA Nanoscience, C/ Faraday 9, Campus de Cantoblanco, Madrid, 28049, Spain.; Unidad de Nanomateriales avanzados, Imdea Nanoscience, Unidad asociada al CSIC por el ICMM, Madrid, 28049, Spain.; Gallardo A; IMDEA Nanoscience, C/ Faraday 9, Campus de Cantoblanco, Madrid, 28049, Spain.; Borin Barin G; Empa-Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, Dübendorf, 8600, Switzerland.; Feng X; Max Planck Institute of Microstructure Physics, Weinberg 2, 06120, Halle, Germany.; Center for Advancing Electronics Dresden (cfaed) & Faculty of Chemistry and Food Chemistry, Technische Universität Dresden, D-01069, Dresden, Germany.; Urgel JI; IMDEA Nanoscience, C/ Faraday 9, Campus de Cantoblanco, Madrid, 28049, Spain.; Unidad de Nanomateriales avanzados, Imdea Nanoscience, Unidad asociada al CSIC por el ICMM, Madrid, 28049, Spain.
Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 0370543 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1521-3773 (Electronic) Linking ISSN: 14337851 NLM ISO Abbreviation: Angew Chem Int Ed Engl Subsets: MEDLINE; PubMed not MEDLINE
Academic Journal
Martini, Leonardo ; Chen, Zongping ; Mishra, Neeraj ; Barin, Gabriela Borin ; Fantuzzi, Paolo ; Ruffieux, Pascal ; Fasel, Roman ; Feng, Xinliang ; Narita, Akimitsu ; Coletti, Camilla ; Müllen, Klaus ; Candini, Andrea
In Carbon May 2019 146:36-43
Academic Journal
Kinikar A; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Xiang F; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Palomino-Ruiz L; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Departamento de Química Orgánica, Facultad de Ciencias, Unidad de Excelencia de Química Aplicada a Biomedicina y Medioambiente (UEQ), Universidad de Granada, 18071 Granada, Spain.; Lu LS; Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16082, United States.; Dong C; Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.; Gu Y; Max Planck Institute for Polymer Research, 55128 Mainz, Germany.; Darawish R; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Department of Chemistry, Biochemistry and Pharmaceutical Sciences, University of Bern, 3012 Bern, Switzerland.; Ammerman E; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Gröning O; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Müllen K; Max Planck Institute for Polymer Research, 55128 Mainz, Germany.; Department of Chemistry, Johannes Gutenberg University Mainz, Duesbergweg 10-14, 55128, Mainz, Germany.; Fasel R; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Department of Chemistry, Biochemistry and Pharmaceutical Sciences, University of Bern, 3012 Bern, Switzerland.; Robinson JA; Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16082, United States.; Two-Dimensional Crystal Consortium, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.; Department of Chemistry and Department of Physics, The Pennsylvania State University, University Park, Pennsylvania 16802, United States.; Ruffieux P; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Schuler B; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Borin Barin G; nanotech@surfaces laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101726750 Publication Model: eCollection Cited Medium: Internet ISSN: 2574-0970 (Electronic) Linking ISSN: 25740970 NLM ISO Abbreviation: ACS Appl Nano Mater Subsets: PubMed not MEDLINE
Academic Journal
Darawish R; Empa, Swiss Federal Laboratories for Materials Science and Technology, Nanotech@surfaces Laboratory 8600 Dübendorf Switzerland gabriela.borinbarin@empa.ch.; Department of Chemistry, Biochemistry and Pharmaceutical Sciences, University of Bern 3012 Bern Switzerland.; Braun O; Empa, Swiss Federal Laboratories for Materials Science and Technology, Transport at Nanoscale Interfaces Laboratory 8600 Dübendorf Switzerland.; Department of Physics, University of Basel 4056 Basel Switzerland.; Müllen K; Max Planck Institute for Polymer Research 55128 Mainz Germany.; Department of Chemistry, Johannes Gutenberg University Mainz Duesbergweg 10-14 55128 Mainz Germany.; Calame M; Empa, Swiss Federal Laboratories for Materials Science and Technology, Transport at Nanoscale Interfaces Laboratory 8600 Dübendorf Switzerland.; Department of Physics, University of Basel 4056 Basel Switzerland.; Swiss Nanoscience Institute, University of Basel 4056 Basel Switzerland.; Ruffieux P; Empa, Swiss Federal Laboratories for Materials Science and Technology, Nanotech@surfaces Laboratory 8600 Dübendorf Switzerland gabriela.borinbarin@empa.ch.; Fasel R; Empa, Swiss Federal Laboratories for Materials Science and Technology, Nanotech@surfaces Laboratory 8600 Dübendorf Switzerland gabriela.borinbarin@empa.ch.; Department of Chemistry, Biochemistry and Pharmaceutical Sciences, University of Bern 3012 Bern Switzerland.; Borin Barin G; Empa, Swiss Federal Laboratories for Materials Science and Technology, Nanotech@surfaces Laboratory 8600 Dübendorf Switzerland gabriela.borinbarin@empa.ch.
Publisher: Royal Society of Chemistry Country of Publication: England NLM ID: 101738708 Publication Model: eCollection Cited Medium: Internet ISSN: 2516-0230 (Electronic) Linking ISSN: 25160230 NLM ISO Abbreviation: Nanoscale Adv Subsets: PubMed not MEDLINE
Academic Journal
Dinh, Christina; Yusufoglu, Muhammed; Yumigeta, Kentaro; Kinikar, Amogh; Sweepe, Thomas; Zeszut, Zoe; Chang, Yao-Jen; Copic, Christian; Janssen, Shelby; Holloway, Richard; Battaglia, Julian; Kuntubek, Aldiyar; Zahin, Farhan; Lin, Yuxuan Cosmi; Vandenberghe, William G.; LeRoy, Brian J.; Müllen, Klaus; Fasel, Roman; Borin Barin, Gabriela; Mutlu, Zafer
Book
Recent Advances in Complex Functional Materials ISBN: 9783319538976
Academic Journal
Borin Barin G; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Sun Q; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Di Giovannantonio M; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Du CZ; State Key Laboratory of Elemento-Organic Chemistry, College of Chemistry, Nankai University, Tianjin, 300071, China.; Wang XY; State Key Laboratory of Elemento-Organic Chemistry, College of Chemistry, Nankai University, Tianjin, 300071, China.; Llinas JP; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, 94720, USA.; Mutlu Z; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, 94720, USA.; Lin Y; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, 94720, USA.; Wilhelm J; Institute of Theoretical Physics, University of Regensburg, D-93053, Regensburg, Germany.; Overbeck J; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Daniels C; Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, 12180, USA.; Lamparski M; Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, 12180, USA.; Sahabudeen H; Center for Advancing Electronics Dresden, Department of Chemistry and Food Chemistry, TU Dresden, 01062, Dresden, Germany.; Perrin ML; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Urgel JI; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Mishra S; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Kinikar A; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Widmer R; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Stolz S; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Bommert M; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Pignedoli C; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Feng X; Center for Advancing Electronics Dresden, Department of Chemistry and Food Chemistry, TU Dresden, 01062, Dresden, Germany.; Calame M; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Müllen K; Max Planck Institute for Polymer Research, 55128, Mainz, Germany.; Department of Chemistry, Johannes Gutenberg-Universität Mainz, 55128, Mainz, Germany.; Narita A; Max Planck Institute for Polymer Research, 55128, Mainz, Germany.; Organic and Carbon Nanomaterials Unit, Okinawa Institute of Science and Technology Graduate University, 1919-1 Tancha, Onna-son, Okinawa, 904-0495, Japan.; Meunier V; Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, 12180, USA.; Bokor J; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, 94720, USA.; Fasel R; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.; Department of Chemistry, Biochemistry and Pharmaceutical Sciences, University of Bern, Bern, 3012, Switzerland.; Ruffieux P; Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, 8600, Switzerland.
Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 101235338 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1613-6829 (Electronic) Linking ISSN: 16136810 NLM ISO Abbreviation: Small Subsets: MEDLINE; PubMed not MEDLINE
Academic Journal
Abdeljaber, O.; Abramovich, H.; Akhavan-Safar, A.; Aliofkhazraei, M.; Alonso, E.; Al-Sarraf, A. H.; Al-Shemy, M.; Altgen, M.; Alves, A.; Ananias, R.; Ando, K.; Arata, Y.; Asmael, M.; Avramidis, S.; Bahmani, M.; Balaev, D.; Banerjee, S.; Bari, E.; Baum, A.; Bechelany, M.; Berglund, L.; Bertolin, C.; Bhattarai, M.; Bhowmik, S.; Boardman, C.; Bockel, S.; Boekaerts, B.; Borges, K. C.; Borin, Barin G.; Bosco, E.; Broda, M.; Broughton, J.; Bruel, C.; Brunetti, M.; Brunner, A.; Cai, Y.; Caldeira, I; Cao, J.; Carmeliet, J.; Carminati, M.; Chai, W-M; Chang, S.; Chen, Q.; Chen, Y.; Chen, Z.; Chen, H.; Cheng, F.; Chung, D.; Classen, B.; Costa, A.; Coussot, P.; Crivellaro, A.; Curling, S.; Damasevicius, R.; Daniel, G.; D'Auria, M.; Dawson, B.; de Oliveira, Affonso C.; de Sousa, R. J. A.; Dehon, G.; Deklerck, V; Delidovich, I; Derikvand, M.; Ding, P.; Dobrowolska, I; Dominguez, Toribio J. C.; Donaldson, L.; Dong, Y.; Doshi, S.; Du, X.; Dunky, M.; Elissetche, Martinez J-P; Emmerich, L.; Evans, P.; Fang, Y.; Fattahi, N.; Fei, B.; Feng, X.; Ferreira, J.; Ferreira, L. F. R.; Ferreira, de Cavalho A.; Fioravanti, M.; Fortino, S.; Fourreh, A. E.; Frazier, C.; Fredriksson, M.; Frese, M.; Fu, Y.; Fukuda, K.; Galgano, A.; Gao, G.; Gerardin, P.; Gericke, M.; Ghavidel, A.; Ghysels, S.; Gindl-Altmutter, W.; Gomez, Escobar, V; Grigoras, V. C.; Guan, G.; Guillen, D.; Guo, C.; Guo, X.; Haapala, A.; Harries, K.; Hayes, W.; Hein, P. R. G.; Hohn, K.; Hou, Q.; Hrcka, R.; Huang, C.; Huang, R.; Hughes, M.; Humar, M.; Ibarra, D.; Inagaki, T.; Isogai, A.; Jakes, J.; Janas, D.; Jarvenpaa, E.; Ji, G.; Jiang, J.; Jiao, L.; Jirous-Rajkovic, V; Johansson, M.; Kacik, F.; Kaliske, M.; Kamke, F.; Kanakaraju, D.; Karl, T.; Kazemi, Najafi S.; Kelley, S.; Khaloian, Sarnaghi A.; Kilpelainen, P.; Kobori, H.; Krystofiak, T.; Koutsawa, Y.; Kumar, A.; Kurata, Y.; Kurdthongmee, W.; Kustas, S.; Lahtinen, M.; Landis, E.; Lautenschlaeger, L.; Le Barbenchon, L.; Le Quang, D.; Leban, J-M; Lee, N-H; Lemaster, R.; Lewandowski, K.; Li, H.; Li, P.; Li, Y.; Li, W.; Lipovac, D.; Liu, D.; Liu, H.; Liu, R.; Liu, W.; Ludovic, M.; Luimes, R.; Luiz, de Paula P.; Lukacevic, M.; Lynam, J.; Lyu, G.; Ma, C.; Ma, X.; Macchioni, N.; Makinen, H.; Mania, P.; Marchal, R.; Martinez-Trujillo, A.; Matan, N.; Matsumoto, Y.; Mazloomi, M. S.; Mazzanti, V; Mei, C.; Merk, V; Miller, J. D.; Mirra, M.; Miyazaki, Y.; Mollica, F.; Moore, J.; Morais, J. P.; Morrell, J.; Mothe, F.; Moutou, Pitti R.; Mueller, U.; Nakano, T.; Narasimharao, K.; Nasir, V; Nejad, M.; Nevares, I; Neyses, B.; Nie, S.; Nisgoski, S.; Nyrud, A.; Obataya, E.; Okoye, P.; Olaniran, S. O.; Olaoye, K.; Olek, W.; Olsson, A.; Orlova, T. S.; Ou, R.; Oven, P.; Ozarska, B.; Ozcifci, A.; Paes, G.; Palanti, S.; Pandey, A. K.; Panzarasa, G.; Patera, A.; Pawar, H. S.; Peng, L.; Penttila, P.; Pereira, Acosta A.; Perrin, M.; Pfriem, A.; Pinheiro, C.; Poletto, M.; Porankiewicz, B.; Potthast, A.; Pretschuh, C.; Price, E.; Raffelt, K.; Ragauskas, A.; Raja, M.; Ravindran, P.; Reynolds, T.; Ribera, Regal J.; Ridley-Ellis, D.; Risse, M.; Rodriguez, R.; Romagnoli, M.; Roohnia, M.; Rozas, Mellado C.; Salem, M.; Salmen, L.; Sanchez-Ferrer, A.; Saranpaa, P.; Sauter, U.; Schmitt, U.; Shak, Pui Yee K.; Shakher, C.; Shukla, P.; Silvestre, S.; Smardzewski, J.; Soge, A.; Souza, D., V; Spear, M.; Strojecki, M.; Suarez-Riestra, F.; Taghiyari, H.; Tan, S. C.; Tanaka, T.; Tanase, C.; Tang, Q.; Tao, H.; Taylor, D.; Teramoto, Y.; Terrazas, T.; Tesarova, D.; Thepaksorn, P.; Thibaut, B.; Thybring, E.; Tintner, J.; Tirumkudulu, M.; Todorovic, N.; Tolvaj, L.; Tomppo, L.; Tsuchikawa, S.; Tusell, J. M.; Ueno, D.; Uhde, E.; Uhl, A.; Vakalis, S.; Van Blokland, J.; Vazhayal, L.; Vek, V.; Via, B.; Viguier, J.; Vincitorio, F.; Vafaeenezhad, H.; Van den Bulcke, J.; Varghese, M.; Ventorim, G.; Vigneshwaran, N.; Wadhwani, R.; Wang, L.; Wang, W.; Wang, Y.; Wanschura, R.; Wei, Y.; Weidenhiller, A.; Wentzel, M.; Wiedenhoeft, A. C.; Willems, W.; Windeisen-Holzhauser, E.; Winkler, C.; Wittel, F.; Woodhouse, J.; Wu, Q.; Wu, Y.; Xie, Y.; Yamamoto, H.; Yamashita, K.; Yamauchi, S.; Yang, J.; Yeh, T-F; Yin, Y.; Yong, Q.; Yoshihara, H.; Younesi-Kordkheili, H.; Young, H-T; Young, T.; Yu, J.; Yu, T.; Yunianti, A. D.; Yurdakul, S.; Zare, E. N.; Zborowska, M.; Zelinka, S.; Zeng, B.; Zhang, S.; Zhu, J. Y.; Zikeli, F.
Academic Journal
In: Carbon . (Carbon, 30 June 2024, 227)
Academic Journal
In: Carbon . (Carbon, 31 January 2024, 218)
Academic Journal
Zhang, J.; Calame, M.; Perrin, M.L.; Qian, L.; Zhang, J.; Borin Barin, G.; Ruffieux, P.; Fasel, R.; Chen, P.; Müllen, K.
In: Materials for Quantum Technology . (Materials for Quantum Technology, 1 September 2023, 3(3))
Academic Journal
Bouwmeester D; Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands.; Ghiasi TS; Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands.; Borin Barin G; nanotech@surfaces Laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Müllen K; Max Planck Institute for Polymer Research, 55128 Mainz, Germany.; Ruffieux P; nanotech@surfaces Laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Fasel R; nanotech@surfaces Laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Department of Chemistry, Biochemistry and Pharmaceutical Chemistry, University of Bern, Freiestrasse 3, CH-3012 Bern, Switzerland.; van der Zant HSJ; Kavli Institute of Nanoscience, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands.
Publisher: American Chemical Society Country of Publication: United States NLM ID: 101726750 Publication Model: eCollection Cited Medium: Internet ISSN: 2574-0970 (Electronic) Linking ISSN: 25740970 NLM ISO Abbreviation: ACS Appl Nano Mater Subsets: PubMed not MEDLINE
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[검색어] Borin, Barin G.
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