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발행년	- (예 : 2010-2015)

Application of quantitative structure property relationship to the design of high refractive index 193i resist

Academic Journal

Liu, H.; Blakey, I.; Whittaker, A.K.; Conley, W.E.; George, G.A.; Hill, D.J.T.

In: Journal of Micro/ Nanolithography, MEMS, and MOEMS. (Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2008, 7(2))

Web of Science Scopus Find it@PNU

Experimental techniques for detection of components extracted from model 193 nm immersion lithography photoresists

Academic Journal

Taylor, J.C.; LeSuer, R.J.; Chambers, C.R.; Fan, F.-R.F.; Bard, A.J.; Conley, W.E.; Willson, C.G.

In: Chemistry of Materials. (Chemistry of Materials, 9 August 2005, 17(16):4194-4203)

Full Text (ACS) Web of Science JCR 저널정보 Scopus Find it@PNU

Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography

Academic Journal

Trinque, B.C.; Chambers, C.R.; Osborn, B.P.; Callahan, R.P.; Lee, G.S.; Kusumoto, S.; Willson, C.G.; Sanders, D.P.; Grubbs, R.H.; Conley, W.E.

In: Journal of Fluorine Chemistry. (Journal of Fluorine Chemistry, 1 July 2003, 122(1):17-26)

Full Text (ScienceDirect 종량제) Web of Science JCR 저널정보 Scopus Find it@PNU

Negative photoresists for optical lithography

Academic Journal

Shaw, J.M.; Gelorme, J.D.; LaBianca, N.C.; Conley, W.E.; Holmes, S.J.

In: IBM Journal of Research and Development. (IBM Journal of Research and Development, January/March 1997, 41(1-2):81-94)

Full Text (ProQuest Central) Web of Science JCR 저널정보 Scopus Find it@PNU

Designing high performance KrF and ArF single layer resists with methacrylate polymers

Academic Journal

Allen, R.D.; Wallraff, G.M.; Hinsberg, W.D.; Conley, W.E.; Kunz, R.R.

In: Journal of Photopolymer Science and Technology. (Journal of Photopolymer Science and Technology, 1993, 6(4):575-591)

Open Access (JSTAGE) Web of Science JCR 저널정보 Scopus Find it@PNU

Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node

Conference

Robert, E.; Henry, D.; Thony, P.; Lucas, K.; Postnikov, S.V.; Kasprowicz, B.; Conley, W.E.; Wu, W.; Litt, L.

In: Proceedings of SPIE - The International Society for Optical Engineering, Optical Microlithography XVIII. (Proceedings of SPIE - The International Society for Optical Engineering, 2005, 5754(PART 1):476-487)

Scopus Find it@PNU

Immersion lithography: Moving microlithography to nanolithography

Conference

Taylor, J.C.; Shayib, R.M.; Willson, C.G.; Chambers, C.R.; LeSuer, R.J.; Conley, W.E.

In: AIChE Annual Meeting, Conference Proceedings, 2004 AIChE Annual Meeting, Conference Proceedings. (AIChE Annual Meeting, Conference Proceedings, 2004, :1029-1034)

Scopus Find it@PNU

Design of dissolution inhibitors for chemically amplified photolithographic systems

Conference

Chambers, C.R.; Kusumoto, S.; Osborn, B.P.; Vasudev, A.; Ootani, M.; Walthal, L.; McMichael, H.; Willson, C.G.; Zimmerman, P.; Conley, W.E.

In: Proceedings of SPIE - The International Society for Optical Engineering, Advances in Resist Technology and Processing XXI. (Proceedings of SPIE - The International Society for Optical Engineering, 2004, 5376(PART 1):360-368)

Scopus Find it@PNU

Dissolution inhibitors for 157 nm photolithography

Conference

Chambers, C.R.; Kusumoto, S.; Vasudev, A.; Walthal, L.; Osborn, B.P.; Willson, C.G.; Lee, G.S.; Zimmerman, P.; Conley, W.E.

In: Proceedings of SPIE - The International Society for Optical Engineering. (Proceedings of SPIE - The International Society for Optical Engineering, 2003, 5039 I:93-102)

Scopus Find it@PNU

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