부산대학교 도서관

Park JY; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, 53706, USA.; Mihalyi-Koch W; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, 53706, USA.; Triggs CT; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, 53706, USA.; Roy CR; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, 53706, USA.; Sanders KM; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, 53706, USA.; Wright JC; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, 53706, USA.; Jin S; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, 53706, USA.

Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 9885358 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1521-4095 (Electronic) Linking ISSN: 09359648 NLM ISO Abbreviation: Adv Mater Subsets: PubMed not MEDLINE; MEDLINE

Guo S; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China.; Mihalyi-Koch W; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA.; Mao Y; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China.; Li X; Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, China.; Bu K; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China.; Hong H; Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, China.; Hautzinger MP; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA.; Luo H; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China.; Wang D; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China.; Gu J; Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, China.; Zhang Y; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China.; Zhang D; Hawaii Institute of Geophysics & Planetology, University of Hawaii Manoa, Honolulu, HI, USA.; Hu Q; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China.; Ding Y; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China.; Yang W; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China.; Fu Y; Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, China. yfu@pku.edu.cn.; Jin S; Department of Chemistry, University of Wisconsin-Madison, Madison, WI, USA. jin@chem.wisc.edu.; Lü X; Center for High Pressure Science and Technology Advanced Research (HPSTAR), Shanghai, China. xujie.lu@hpstar.ac.cn.

Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: PubMed not MEDLINE; MEDLINE

Mihalyi-Koch, W.; Pan, D.; Lafayette, D.P.; Scheeler, J.M.; Sanders, K.M.; Wright, J.C.; Jin, S.; Guo, S.; Lü, X.; Dai, Z.; Rappe, A.M.; Teat, S.J.

In: Chem. (Chem, 11 July 2024, 10(7):2180-2195)

Triggs, C.T.; Ross, R.D.; Mihalyi-Koch, W.; Clewett, C.F.M.; Sanders, K.M.; Guzei, I.A.; Jin, S.

In: ACS Energy Letters. (ACS Energy Letters, 12 April 2024, 9(4):1835-1843)

Mihalyi-Koch W; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; Folpini G; Center for Nano Science and Technology @Polimi, Istituto Italiana di Tecnologia, 20134 Milano, Italy.; Roy CR; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; Kaiser W; Computational Laboratory for Hybrid/Organic Photovoltaics (CLHYO), Istituto CNR di Scienze e Tecnologie Chimiche 'Giulio Natta' (CNR-SCITEC), 06123 Perugia, Italy.; Wu CS; Center for Nano Science and Technology @Polimi, Istituto Italiana di Tecnologia, 20134 Milano, Italy.; Sanders KM; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; Guzei IA; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; Wright JC; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; De Angelis F; Computational Laboratory for Hybrid/Organic Photovoltaics (CLHYO), Istituto CNR di Scienze e Tecnologie Chimiche 'Giulio Natta' (CNR-SCITEC), 06123 Perugia, Italy.; Department of Chemistry, Biology and Biotechnology, University of Perugia and UdR INSTM, 06123 Perugia, Italy.; Department of Natural Sciences & Mathematics, College of Sciences & Human Studies, Prince Mohammad Bin Fahd University, Dhahran 34754, Saudi Arabia.; SKKU Institute of Energy Science and Technology (SIEST) Sungkyunkwan University, Suwon, Korea, 440-746.; Cortecchia D; Center for Nano Science and Technology @Polimi, Istituto Italiana di Tecnologia, 20134 Milano, Italy.; Dipartimento di Chimica Industriale 'Toso Montanari', Università di Bologna, 40136 Bologna, Italy.; Petrozza A; Center for Nano Science and Technology @Polimi, Istituto Italiana di Tecnologia, 20134 Milano, Italy.; Jin S; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 7503056 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1520-5126 (Electronic) Linking ISSN: 00027863 NLM ISO Abbreviation: J Am Chem Soc Subsets: PubMed not MEDLINE; MEDLINE

Forlano, K.M.; Roy, C.R.; Mihalyi-Koch, W.; Sanders, K.; Guzei, I.; Wright, J.C.; Jin, S.; Hossain, T.; Graham, K.R.

In: ACS Materials Letters. (ACS Materials Letters, 6 November 2023, 5(11):2913-2921)

Ratté J; Department of Physics and Astronomy, University of Western Ontario, London, ON N6A 3K7, Canada.; Macintosh MF; Department of Chemistry, University of Western Ontario, London, ON N6A 5B7, Canada.; DiLoreto L; Department of Chemistry, University of Western Ontario, London, ON N6A 5B7, Canada.; Liu J; Department of Chemistry, University of Western Ontario, London, ON N6A 5B7, Canada.; Mihalyi-Koch W; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; Hautzinger MP; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; Guzei IA; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; Dong Z; Shanghai Synchrotron Radiation Facility (SSRF), Shanghai Institute of Applied Physics, CAS, Shanghai, 201204, PR China.; Jin S; Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, United States.; Song Y; Department of Physics and Astronomy, University of Western Ontario, London, ON N6A 3K7, Canada.; Department of Chemistry, University of Western Ontario, London, ON N6A 5B7, Canada.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101526034 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1948-7185 (Electronic) Linking ISSN: 19487185 NLM ISO Abbreviation: J Phys Chem Lett Subsets: PubMed not MEDLINE; MEDLINE

In: Chem. (Chem, 11 July 2024, 10(7):1965-1967)