부산대학교 도서관

H. Zelinska; U. Andrusiv

Вісник аграрної науки Причорномор'я, Vol 25, Iss 2, Pp 11-18 (2021)

Boehme SC; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Burian M; Swiss Light Source, Paul Scherrer Institute, 5232 Villigen, Switzerland.; Bertolotti F; Department of Science and High Technology and To.Sca.Lab., University of Insubria, via Valleggio 11, 22100 Como, Italy.; Cherniukh I; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Bernasconi C; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Zhu C; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Erni R; Electron Microscopy Center, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Amenitsch H; Institute of Inorganic Chemistry, Graz University of Technology, 8010 Graz, Austria.; Naumenko D; Institute of Inorganic Chemistry, Graz University of Technology, 8010 Graz, Austria.; Andrusiv H; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Semkiv N; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; John RA; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Baldwin A; Cavendish Laboratory, University of Cambridge, JJ Thomson Avenue, Cambridge CB3 0HE, U.K.; Department of Chemical Engineering & Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge CB3 0AS, U.K.; Galkowski K; Cavendish Laboratory, University of Cambridge, JJ Thomson Avenue, Cambridge CB3 0HE, U.K.; Masciocchi N; Department of Science and High Technology and To.Sca.Lab., University of Insubria, via Valleggio 11, 22100 Como, Italy.; Stranks SD; Cavendish Laboratory, University of Cambridge, JJ Thomson Avenue, Cambridge CB3 0HE, U.K.; Department of Chemical Engineering & Biotechnology, University of Cambridge, Philippa Fawcett Drive, Cambridge CB3 0AS, U.K.; Rainò G; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.; Guagliardi A; Istituto di Cristallografia and To.Sca.Lab, Consiglio Nazionale delle Ricerche, via Valleggio 11, 22100 Como, Italy.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, 8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa, Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland.

Publisher: American Chemical Society Country of Publication: United States NLM ID: 101313589 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1936-086X (Electronic) Linking ISSN: 19360851 NLM ISO Abbreviation: ACS Nano Subsets: PubMed not MEDLINE; MEDLINE

U., Andrusiv; H., Zelinska; O., Galtsova; O., Seleznova; M., Bahorka; N., Yurchenko

Financial & Credit Activity: Problems of Theory & Practice. 2022, Vol. 2 Issue 43, p248-258. 11p.

Milanese, S.; De Giorgi, M.L.; Anni, M.; Morello, G.; Cretì, A.; Lomascolo, M.; Qualtieri, A.; Andrusiv, H.; Bodnarchuk, M.I.; Kovalenko, M.V.

In: Materials Today Physics. (Materials Today Physics, June 2023, 35)

L., Simkiv; U., Andrusiv; H., Kupalova; N., Goncharenko; O., Dzoba; O., Yushkevych

Financial & Credit Activity: Problems of Theory & Practice; 2022, Vol. 3 Issue 44, p347-356, 10p

Sulym, H. (PL-TUB-NDM) AMS Author Profile; Andrusiv, L. (1-USAF-NDM) AMS Author Profile; Pasternak, Y. (UKR-LUTTU) AMS Author Profile

ZAMM. Zeitschrift für Angewandte Mathematik und Mechanik. Journal of Applied Mathematics and Mechanics (ZAMM Z. Angew. Math. Mech.) (20150101), 95, no.~11, 1282-1289. ISSN: 0044-2267 (print).eISSN: 1521-4001.

Zelinska, H; Andrusiv, U; Fedorovych, I; Khvostina, I; Astafiev, O

IOP Conference Series: Earth & Environmental Science; 2021, Vol. 628, p1-10, 10p

Krieg F; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.; Sercel PC; Center for Hybrid Organic Inorganic Semiconductors for Energy, 15013 Denver West Parkway, Golden, Colorado 80401, United States.; Department of Applied Physics and Materials Science, California Institute of Technology, Pasadena, California 91125, United States.; Burian M; Swiss Light Source, Paul Scherrer Institute, 5232 Villigen PSI, Switzerland.; Andrusiv H; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.; Bodnarchuk MI; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.; Stöferle T; IBM Research Europe - Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.; Mahrt RF; IBM Research Europe - Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.; Naumenko D; Institute of Inorganic Chemistry, Graz University of Technology, Stremayrgasse 9/V, 8010 Graz, Austria.; Amenitsch H; Institute of Inorganic Chemistry, Graz University of Technology, Stremayrgasse 9/V, 8010 Graz, Austria.; Rainò G; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.; Kovalenko MV; Institute of Inorganic Chemistry, Department of Chemistry and Applied Biosciences, ETH Zürich, Vladimir Prelog Weg 1, CH-8093 Zürich, Switzerland.; Laboratory for Thin Films and Photovoltaics, Empa - Swiss Federal Laboratories for Materials Science and Technology, Überlandstrasse 129, CH-8600 Dübendorf, Switzerland.

Publisher: ACS Publications Country of Publication: United States NLM ID: 101660035 Publication Model: Print-Electronic Cited Medium: Print ISSN: 2374-7943 (Print) Linking ISSN: 23747943 NLM ISO Abbreviation: ACS Cent Sci Subsets: PubMed not MEDLINE

Yanovytska, H.; Mykhayliv, M.; Kravchyk, M.; Yanovytska, A.; Andrusiv, U.

In: Revista Juridica Portucalense. (Revista Juridica Portucalense, December 2023, (34):53-79)

Andrusiv, U.; Zelinska, H.; Popadynets, I.; Lagodiienko, V.; Kupalova, H.; Goncharenko, N.

In: Production Engineering Archives. (Production Engineering Archives, 1 September 2023, 29(3):263-270)