학술논문

Revealing the controlling mechanisms of atomic layer etching for high-k dielectrics in conventional inductively coupled plasma etching tool
Document Type
Article
Source
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. (Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1 September 2024, 42(5))
Subject
Language
English
ISSN
15208559
07342101