학술논문

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발행년	- (예 : 2010-2015)

Investigation of the impact of environmental conditions on the mechanical properties of thin-film copper wafers

Academic Journal

Pham, Q.-P.; Hoa, L.N.Q.; Haq, M.A.; Huy, L.N.Q.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. (Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2 September 2024, 63(9))

Web of Science JCR 저널정보 Scopus Find it@PNU

Study on Ductile-To-Brittle Transition Behavior in Fixed Diamond Abrasive Wire Sawing Process of Monocrystalline Silicon Ingot

Academic Journal

Pham, Q.-P.; Hoa, L.N.Q.; Haq, M.A.; Huy, L.N.Q.

In: International Journal of Engineering Trends and Technology. (International Journal of Engineering Trends and Technology, March 2024, 72(3):193-207)

Scopus Find it@PNU

Automated Vickers hardness system with closed-loop control for polishing pads for semiconductor production

Academic Journal

Huy, L.N.Q.; Hoa, L.N.Q.; Haq, M.A.; Huynh, T.-T.

In: Instrumentation Science and Technology. (Instrumentation Science and Technology, 2024, 52(4):401-414)

Full Text (FRIC Online Journal) Web of Science JCR 저널정보 Scopus Find it@PNU

Modeling of material removal in copper blanket wafer polishing based on the hard polishing pad microstructure

Academic Journal

Huy, L.N.Q.; Hoa, L.N.Q.; Chen, C.-C.A.

In: International Journal of Advanced Manufacturing Technology. (International Journal of Advanced Manufacturing Technology, October 2023, 128(9-10):4455-4468)

Full Text (ECC - 개별구독 전자저널) Web of Science JCR 저널정보 Scopus Find it@PNU

An investigation of the Vickers hardness of polishing pads using simulations based on microtomography model

Academic Journal

Huy, L.N.Q.; Hoa, L.N.Q.

In: Japanese Journal of Applied Physics. (Japanese Journal of Applied Physics, 1 May 2023, 62(5))

Full Text (IOP) Web of Science JCR 저널정보 Scopus Find it@PNU

Development of modeling to investigate polyurethane pad hardness in chemical mechanical planarization/polishing (CMP) process

Academic Journal

Huy, L.N.Q.; Lin, C.-Y.; Chen, C.-C.A.

In: Japanese Journal of Applied Physics. (Japanese Journal of Applied Physics, 1 August 2022, 61(SJ))

Full Text (IOP) Web of Science JCR 저널정보 Scopus Find it@PNU

Leveraging Self-Attention Mechanism for Deep Learning in Hand-Gesture Recognition System

Conference

Haq, M.A.; Ridlwan, M.; Naila, I.; Huy, L.N.Q.

In: E3S Web of Conferences, 1st International Conference on Environment, Green Technology, and Digital Society, INTERCONNECTS 2023. (E3S Web of Conferences, 11 March 2024, 500)

Full Text (ProQuest Central) Scopus Find it@PNU

Multi-Angle Facial Recognition: Enhancing Biometric Security with a Broadly Positioned Stereo-Camera System

Conference

Haq, M.A.; Ridlwan, M.; Naila, I.; Huy, L.N.Q.

In: E3S Web of Conferences, 1st International Conference on Environment, Green Technology, and Digital Society, INTERCONNECTS 2023. (E3S Web of Conferences, 11 March 2024, 500)

Full Text (ProQuest Central) Scopus Find it@PNU

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