학술논문

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발행년	- (예 : 2010-2015)

전체선택

Plasma induced substrate damage in high dose implant resist strip process

Conference

Bor-Wen Chan; Baw-Ching Perng; Sheu, L.; Yuan-Hung Chiu; Han-Jan Tao

2003 8th International Symposium Plasma- and Process-Induced Damage. Plasma- and process-induced damage Plasma- and Process-Induced Damage, 2003 8th International Symposium. :73-76 2003

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Novel 20nm hybrid SOI/bulk CMOS technology with 0.183/spl mu/m/sup 2/ 6T-SRAM cell by immersion lithography

Conference

Hou-Yu Chen; Chang-Yun Chang; Chien-Chao Huang; Tang-Xuan Chung; Sheng-Da Liu; Jiunn-Ren HwangYi-Hsuan Liu; Yu-Jun Chou; Hong-Jang Wu; King-Chang Shu; Chung-Kan Huang; Jan-Wen You; Jaw-Jung Shin; Chun-Kuang Chen; Chia-Hui Lin; Ju-Wang Hsu; Bao-Chin Perng; Pang-Yen Tsai; Chi-Chun Chen; Jyu-Horng Shieh; Han-Jan Tao; Shin-Chang Chen; Tsai-Sheng Gau; Fu-Liang Yang

Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. VLSI Technology VLSI Technology, 2005. Digest of Technical Papers. 2005 Symposium on. :16-17 2005

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5nm-gate nanowire FinFET

Conference

Fu-Liang Yang; Di-Hong Lee; Hou-Yu Chen; Chang-Yun Chang; Sheng-Da Liu; Cheng-Chuan Huang; Tang-Xuan Chung; Hung-Wei Chen; Chien-Chao Huang; Yi-Hsuan Liu; Chung-Cheng Wu; Chi-Chun Chen; Shih-Chang Chen; Ying-Tsung Chen; Ying-Ho Chen; Chih-Jian Chen; Bor-Wen Chan; Peng-Fu Hsu; Jyu-Horng Shieh; Han-Jan Tao; Yee-Chia Yeo; Yiming Li; Jam-Wem Lee; Pu Chen; Mong-Song Liang; Chenming Hu

Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. VLSI technology VLSI Technology, 2004. Digest of Technical Papers. 2004 Symposium on. :196-197 2004

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A 65nm node strained SOI technology with slim spacer

Conference

Fu-Liang Yang; Chien-Chao Huang; Hou-Yu Chen; Jhon-Jhy Liaw; Tang-Xuan Chung; Hung-Wei Chen; Chang-Yun Chang; Cheng Chuan Huang; Kuang-Hsin Chen; Di-Hong Lee; Hsun-Chih Tsao; Cheng-Kuo Wen; Shui-Ming Cheng; Yi-Ming Sheu; Ke-Wei Su; Chi-Chun Chen; Tze-Liang Lee; Shih-Chang Chen; Chih-Jian Chen; Cheng-hung Chang; Jhi-cheng Lu; Weng Chang; Chuan-Ping Hou; Ying-Ho Chen; Kuei-Shun Chen; Ming Lu; Li-Wei Kung; Yu-Jun Chou; Fu-Jye Liang; Jan-Wen You; King-Chang Shu; Bin-Chang Chang; Jaw-Jung Shin; Chun-Kuang Chen; Tsai-Sheng Gau; Bor-Wen Chan; Yi-Chun Huang; Han-Jan Tao; Jyh-Huei Chen; Yung-Shun Chen; Yee-Chia Yeo; Fung, S.K.-H.; Diaz, C.H.; Wu, C.-M.M.; Lin, B.J.; Liang, M.-S.; Sun, J.Y.-C.; Chenming Hu

IEEE International Electron Devices Meeting 2003 Electron devices IEDM'03 Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International. :27.2.1-27.2.4 2003

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Novel 20nm hybrid SOI/bulk CMOS technology with 0.183μm2 6T-SRAM cell by immersion lithography.

Conference

2005 Digest of Technical Papers. 2005 Symposium on VLSI Technology; 2005, p16-17, 2p

Full Text (IEEE) Find it@PNU

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