학술논문

Investigation of Vacuum Measurement by Nano-gap Device / ナノギャップデバイスによる真空度測定の検討
Document Type
Journal Article
Source
電気学会論文誌E(センサ・マイクロマシン部門誌) / IEEJ Transactions on Sensors and Micromachines. 2023, 143(12):391
Subject
cold cathode field emission
electron beam lithography
nanogap
vacuum
ナノギャップ
冷陰極電界放出
真空
電子線描画
Language
Japanese
ISSN
1341-8939
1347-5525
Abstract
Advances in microfabrication technology have enabled electron beam lithography (EB lithography) systems to produce microfabrication on the order of tens of nanometers. Using this technology, we have fabricated nanogap electrodes that can generate large electric fields at low voltages. The gap between the tips of the fabricated electrodes is 100 nm, and the curvature of each tip is 50 nm. The device was confirmed to work as an electronic vacuum gauge, The device successfully measured vacuum from 10-3 Pa to 1 Pa at the electrode voltage of 3 V.