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Highly oriented crystalline si on epitaxial Gd2O3/Si(111) substrate using low-cost Radio Frequency sputtering for Silicon on Insulator application

Document Type

Article

Author

Patil, S.; Pandey, A.H.; Bhunia, S.; Sharma, A.; Laha, A.; Deshpande, V.; Ganguly, U.; Kumar, S.; Kamaliya, B.; Mote, R.G.; Lashkare, S.

Source

In: Thin Solid Films. (Thin Solid Films, 30 March 2024, 793)

Subject

Language

English

ISSN

00406090

Online Access

Full Text (ScienceDirect 종량제) Web of Science JCR 저널정보 Scopus Find it@PNU

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