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Nanoscale morphology tailoring in plasma deposited CN x layers

Document Type

Article

Author

Vasin, A.; Slobodian, O.; Rusavsky, A.; Gudymenko, O.; Lytvyn, P.; Bortchagovsky, E.; Dzhagan, V.; Nazarov, A.; Tiagulskyi, S.; Yatskiv, R.; Grym, J.; Zahn, D.

Source

In: Journal of Physics D: Applied Physics. (Journal of Physics D: Applied Physics, 6 July 2023, 56(27))

Subject

Language

English

ISSN

13616463
00223727

Online Access

Full Text (IOP Science) Full Text (IOP) Web of Science JCR 저널정보 Scopus Find it@PNU

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