학술논문
Impact of Channel Doping Concentration on the Performance Characteristics and the Reliability of Ultra-Thin Double Gate DG-FinFET Compared with Nano-Single Gate FD-SOI-MOSFET by Using TCAD-Silvaco Tool
Document Type
Article
Author
Source
In: Silicon . (Silicon, May 2022, 14(7):3477-3491)
Subject
Language
English
ISSN
18769918
1876990X
1876990X