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Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films

Document Type

Article

Author

Ali, T.; Lehninger, D.; Lederer, M.; Li, S.; Kühnel, K.; Mart, C.; Mertens, K.; Hoffmann, R.; Olivo, R.; Emara, J.; Biedermann, K.; Czernohorsky, M.; Kämpfe, T.; Seidel, K.; Metzger, J.; Binder, R.; Müller, J.; Eng, L.M.

Source

In: Advanced Electronic Materials. (Advanced Electronic Materials, May 2022, 8(5))

Subject

Language

English

ISSN

2199160X

Online Access

Full Text (Wiley Journals) Web of Science JCR 저널정보 Scopus Find it@PNU

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