학술논문
Numerically controlled sacrificial plasma oxidation using array of electrodes for improving thickness uniformity of SOI
Document Type
Conference
Author
Source
2010 IEEE International SOI Conference (SOI) SOI Conference (SOI), 2010 IEEE International. :1-2 Oct, 2010
Subject
Language
ISSN
1078-621x
Abstract
An array of electrodes covering one-sixth of the area of an 8″ wafer was developed as a prototype system for NC sacrificial plasma oxidation. It was demonstrated that the system can be used for simultaneous NC processes by the individual control of the plasma-on time of each electrode.