학술논문
Intelligent sensitivity tracking of manufacturing tool tuning
Document Type
Conference
Author
Source
2015 Joint e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM) e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM), 2015 Joint. :1-4 Sep, 2015
Subject
Language
Abstract
The manufacturing processes in semiconductor industry can be enhanced to increase the yields and reduce the non-production wafers by maintaining the accuracy of the sensitivities for offline tool tuning. The turning values of most modules are usually calculated by utilizing design of experimental (DOE) data, which provide the sensitivity tables, and also the experiences of engineers. These sensitivity tables are not always suitable for tools due to various tool conditions. Therefore, a DOE-wafer-free methodology to track the integrity of sensitivity table is hereby proposed.