학술논문

Microstructural Analysis of W-Doped TiO2 Thin Films Deposited by Sputtering
Document Type
Article
Source
ECS Transactions; October 2019, Vol. 94 Issue: 1 p211-217, 7p
Subject
Language
ISSN
19385862; 19386737
Abstract
The paper presents results of synthesis and characterization of TiO2 thin films doped with low percentages of tungsten using the magnetron co-sputtering technique. The influence of tungsten concentration on the structure, hardness and electrical resistivity was analyzed using different characterization techniques such as X-ray diffraction, FE-SEM, EDS, Vickers hardness testing and Keithley high-strength electrometer. The deposits were synthesized in an inert atmosphere at room temperature. Subsequent, post-deposit thermal treatments were used at 500 deg C for 3 hours. The presence of the rutile and anatase phases were identified by XRD, where rutile was majority. The surface morphology was analyzed using FE-SEM where clusters of small particles with a size of 10 nm could be observed. Vickers hardness values reached 21.70 GPa, while electrical resistivity values showed a highly resistive behavior of 2.57 x1011 O.sq, which allows this material to be an excellent candidate for corrosion protection.