학술논문
Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry.
Document Type
Article
Author
Tanksalvala, Michael; Porter, Christina L.; Esashi, Yuka; Bin Wang; Jenkins, Nicholas W.; Zhe Zhang; Miley, Galen P.; Knobloch, Joshua L.; McBennett, Brendan; Naoto Horiguchi; Sadegh Yazdi; Jihan Zhou; Jacobs, Matthew N.; Bevis, Charles S.; Karl Jr., Robert M.; Johnsen, Peter; Ren, David; Waller, Laura; Adams, Daniel E.; Cousin, Seth L.
Source
Subject
*ELECTRON holography
*REFLECTOMETRY
*SECONDARY ion mass spectrometry
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Language
ISSN
2375-2548
Abstract
The article discusses x-ray imaging has explored for decades and visible-wavelength microscopy for centuries, has the spectral region in between the extreme ultraviolet has explored for imaging nanostructures and nanomaterials. Topics include the dimensions of devices shrink to the nanoscale, performance has governed by interface quality or precise chemical or dopant composition; and the practical implementation of coherent extreme ultraviolet light sources based on high-harmonic generation.