학술논문
H atom surface loss kinetics in pulsed inductively coupled plasmas.
Document Type
Article
Author
Source
Subject
*HYDROGEN atom
*PLASMA sources
*PLASMA gases
*PLASMA physics
*INDUCTIVELY coupled plasma spectrometry
*HYDROCARBONS
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Language
ISSN
0963-0252
Abstract
Pulsed plasmas are very powerful tools to investigate mechanisms. This paper is focused on H atom kinetics in low-pressure high-density inductively coupled pulsed plasmas. We explore pure H2, H2/N2, CH4/H2 and CH4/N2 mixtures. These gas mixtures offer two very different kinds of wall conditions, which are stainless-steel and hydrocarbon-coated walls. It shows that H loss probability (β) is sensitive to wall conditions. Efforts are made to understand β evolutions with the different parameters. The effect of pressure in non-depositing plasmas is also investigated. Evolution of H atom surface loss probability is linked to ion flux measurements. Ion bombardment promotes H surface loss. [ABSTRACT FROM AUTHOR]