학술논문

Analysis of Dynamic Impedance for Different Phases of Pseudospark-Driven Electron Beam
Document Type
Periodical
Source
IEEE Transactions on Electron Devices IEEE Trans. Electron Devices Electron Devices, IEEE Transactions on. 70(11):5916-5920 Nov, 2023
Subject
Components, Circuits, Devices and Systems
Engineered Materials, Dielectrics and Plasmas
Impedance
Anodes
Electron beams
Cathodes
Electric breakdown
Discharges (electric)
Capacitance
Dynamic impedance
electron beam source (EBS)
plasma
pseudospark (PS)
Language
ISSN
0018-9383
1557-9646
Abstract
In this article, the dynamic impedance of a pseudospark (PS)-driven electron beam has been analyzed for different phases of breakdown over a range of applied gap voltage (AGV). The electron beam is generated through a PS mechanism device, which consists of a hollow cathode, an interelectrode three-gap structure with two floating anodes, and one anode disk. The developed device has been operated in the self-breakdown mode for AGV ranging from 10 to 30 kV. The electron beam source (EBS) has been characterized and analyzed in terms of its V – I characteristics, impedance during different phases, relative impedance during breakdown under different gap voltages, gap capacitance, inductance, and resistance.